Measurements of the thickness of the oxide layer of manufactured integrated circuits
Data for Exercises 6.49 and 7.47
Chipavg
A data frame/tibble with 30 observations on three variables
thickness of the oxide layer for wafer1
thickness of the oxide layer for wafer2
average thickness of the oxide layer of the eight measurements obtained from each set of two wafers
Yashchin, E. 1995. “Likelihood Ratio Methods for Monitoring Parameters of a Nested Random Effect Model.” Journal of the American Statistical Association, 90, 729-738.
Kitchens, L. J. (2003) Basic Statistics and Data Analysis. Pacific Grove, CA: Brooks/Cole, a division of Thomson Learning.
EDA(Chipavg$thickness)
t.test(Chipavg$thickness, mu = 1000)
boxplot(Chipavg$wafer1, Chipavg$wafer2, name = c("Wafer 1", "Wafer 2"))
shapiro.test(Chipavg$wafer1)
shapiro.test(Chipavg$wafer2)
t.test(Chipavg$wafer1, Chipavg$wafer2, var.equal = TRUE)Please choose more modern alternatives, such as Google Chrome or Mozilla Firefox.